PELCO® Silicon Aperture Frames (without support film)

The PELCO® Silicon Aperture Frames are 3mm disc-type frames with a thickness of 200µm and square or rectangular apertures. They are useful for a variety of applications:

  • Support frame to attach TEM lamellae made with FIB
  • Support frame for thin films, foils, wires and fibers
  • Mask for thin film research (deposition mask)

Product Specifications

  • Single Aperture Opening Sizes: 0.25 x 0.25mm, 0.5 x 0.5mm, 0.75 x 0.75mm, 1 x 1mm, and 0.5 x 1.5mm
  • Multiple Aperture Opening Sizes: 9 windows of 0.1 x 0.1mm in a 3 x 3 array or 2 windows of 0.1 x 1.5mm
  • Window Side Angle: 35.26°
  • Aperture Frame Thickness: 200µm
  • Aperture Frame Diameter: 3mm
  • Aperture Material: Si
  • Surface: Top side Si, back side (larger opening) has 50nm layer of Si3N4 for single aperture and 15nm Si3N4 for multiple apertures.
  • Packaging: The PELCO® Silicon Aperture Frames are packaged under cleanroom conditions in a small vial holding 10 discs.

PELCO® Silicon Nitride Coated and Silicon Ø3mm Discs (blanks)

These 3mm Silicon discs have an ultra-flat (Ra 0.45 ± 0.2nm) 50nm ultra-low-stress Silicon Nitride layer on both sides. Also available with a hydrophilic or hydrophobic surface coating or just as a silicon disk. The disks are made with the same state-of-the-art manufacturing techniques as the PELCO® Silicon Nitride Support Films. The disk are perfectly round and have the Easygrip™ edge for easy handling. Clean surface, no broken edges and free of debris often associated with other manufacturing processes. The ultra-low-stress film is nonstoichiometric and closer to SiN than Si3N4. They can be used for a number of applications:

  • Specimen mounts for SEM and FESEM applications
  • Specimen discs for AFM applications
  • Blanks to build the PELCO® Liquid Cell™ together with the PELCO® Silicon Nitride Membrane

Product Specifications

  • Film Thickness: 50nm ultra-low-stress Silicon Nitride on both sides
  • Hydrophilic: 5nm atomic layer-deposited hydroxylated alumina on 50nm ultra-low-stress silicon nitride More Details
  • Hydrophobic: 5nm atomic layer-deposited alumina and fluoro-methylsilane on ultra-low-stress silicon nitride. More Details
  • Disk Thickness: 200µm silicon support
  • Disk Diameter: 3mm
  • Surface Roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm
  • Packaging: The PELCO® Silicon Nitride Discs with hydrophilic or hydrophobic coating are packaged under cleanroom conditions in the PELCO® #160 TEM Grid Storage box. Each box holds 10 discs. The other discs are packed in a vial holding 10 discs.

SI DISKS, PKG/10

PELCO® Silicon Discs, Ø3mm, No Coating

SI3N4 DISKS,HYDROPHOBIC,PKG/10

PELCO® Silicon Nitride Coated Discs with hydrophobic coating, Ø3mm

SI3N4 DISKS, 3MM PK/10

PELCO® Silicon Nitride Ø3mm Disks

SI3N4 DISKS HYDROPHILIC, PKG10

PELCO® Silicon Nitride Coated Discs with hydrophilic coating, Ø3mm

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