SI3N4 HYDROPHOBIC 200NM,0.5X0.

Hydrophobic: 2.5nm atomic layer-deposited alumina and fluoro-methyl-silane on 15, 50 and 200nm ultra-low-stress silicon nitride membrane

Silicon Nitride membranes have been modified using Atomic Layer-Deposited (ALD) techniques to change their surface properties. Depending on the process used, both Hydrophilic and Hydrophobic substrates have been created with the following advantages:

• Choice between low and high surface energies
• Smooth and conformal substrates
• Enhanced wetting and biocompatibility (hydrophilic)
• No need for plasma treatment of surface prior to cell growth
• Hydrophobic coating offers novel platform for deposition and growth of nanomaterials

Hydrophobic surfaces improve sample preparation for materials that are dissolved or suspended in organics solvents. Nanoparticles in organic solvents (such as carbon nanotubes) will readily disperse on the Silicon Nitride membrane surface.