SI3N4 HYDROPHILIC 50NM 0.5X0.5

Hydrophilic: 2.5nm atomic layer-deposited hydroxylated alumina on 15, 50 and 200nm ultra-low-stress silicon nitride membrane

Silicon Nitride membranes have been modified using Atomic Layer-Deposited (ALD) techniques to change their surface properties. Depending on the process used, both Hydrophilic and Hydrophobic substrates have been created with the following advantages:

• Choice between low and high surface energies
• Smooth and conformal substrates
• Enhanced wetting and biocompatibility (hydrophilic)
• No need for plasma treatment of surface prior to cell growth
• Hydrophobic coating offers novel platform for deposition and growth of nanomaterials

Hydrophobic surfaces improve sample preparation for materials that are dissolved or suspended in organics solvents. Nanoparticles in organic solvents (such as carbon nanotubes) will readily disperse on the Silicon Nitride membrane surface. 
Hydrophilic surfaces enhance wetting and dispersion of aqueous solutions. This avoids particle aggregation effects commonly observed on less hydrophilic surfaces. Particularly useful in water based sols and life science applications.