PELCO® Precision Lapping Fixtures

Precision lapping, polishing, and thinning for all sample types

Precision hand lapping fixtures allow for the preparation of planar, parallel, and highly polished surfaces on metallographic specimens, single-crystal wafers, electronic materials, glasses, or other materials.

Lapping processes are also used to generate highly parallel, smooth faces, and to thin specimens to a precise target thickness. This is particularly useful in hand polishing semiconductors, optical components, and for thinning TEM specimens before finishing via dimple polishing.

PELCO® lapping fixtures allow for lapping of samples from <1/8" (3mm) to 1" (25mm) in diameter, and up to 1/2" (13 mm) thick. Micrometer and shim-controlled versions are available. Fixtures are equipped with tungsten carbide feet, which are highly resistant to wear from the lapping process.

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A selection of premium polishing cloths for coarse and fine polishing of hard, soft and composite materials. Most cloths are available with plain or PSA backing for easy mounting on the polishing discs. The plain polishing cloths need to be clamped on the polishing discs with a clamping ring. To facilitate this the plain discs are aproximately 2" larger than the polishing discs so the cloth folds over the edge of the disc for clamping. 8" plain polishing cloths are 10" diameter and 10" plain polishing cloths are 12" diameter. The polishing cloths can be used with diamond compound, diamond spray or alumina suspension.

Hard Cloths

• Low resilience, (e.g. Woven Nylon)
• Used for rough and intermediate polishing

Soft Cloths

• High resilience
• Low nap (e.g. Rayon pile)
• Used for final polishing