PELCO® Silicon Aperture Frames (without support film)
The PELCO® Silicon Aperture Frames are 3mm disc-type frames with a thickness of 200µm and square or rectangular apertures. They are useful for a variety of applications:
- Support frame to attach TEM lamellae made with FIB
- Support frame for thin films, foils, wires and fibers
- Mask for thin film research (deposition mask)
Product Specifications
- Single Aperture Opening Sizes: 0.25 x 0.25mm, 0.5 x 0.5mm, 0.75 x 0.75mm, 1 x 1mm, and 0.5 x 1.5mm
- Multiple Aperture Opening Sizes: 9 windows of 0.1 x 0.1mm in a 3 x 3 array or 2 windows of 0.1 x 1.5mm
- Window Side Angle: 35.26°
- Aperture Frame Thickness: 200µm
- Aperture Frame Diameter: 3mm
- Aperture Material: Si
- Surface: Top side Si, back side (larger opening) has 50nm layer of Si3N4 for single aperture and 15nm Si3N4 for multiple apertures.
- Packaging: The PELCO® Silicon Aperture Frames are packaged under cleanroom conditions in a small vial holding 10 discs.
PELCO® Silicon Nitride Coated and Silicon Ø3mm Discs (blanks)
These 3mm Silicon discs have an ultra-flat (Ra 0.45 ± 0.2nm) 50nm ultra-low-stress Silicon Nitride layer on both sides. Also available with a hydrophilic or hydrophobic surface coating or just as a silicon disk. The disks are made with the same state-of-the-art manufacturing techniques as the PELCO® Silicon Nitride Support Films. The disk are perfectly round and have the Easygrip™ edge for easy handling. Clean surface, no broken edges and free of debris often associated with other manufacturing processes. The ultra-low-stress film is nonstoichiometric and closer to SiN than Si3N4. They can be used for a number of applications:
- Specimen mounts for SEM and FESEM applications
- Specimen discs for AFM applications
- Blanks to build the PELCO® Liquid Cell™ together with the PELCO® Silicon Nitride Membrane
Product Specifications
- Film Thickness: 50nm ultra-low-stress Silicon Nitride on both sides
- Hydrophilic: 5nm atomic layer-deposited hydroxylated alumina on 50nm ultra-low-stress silicon nitride More Details
- Hydrophobic: 5nm atomic layer-deposited alumina and fluoro-methylsilane on ultra-low-stress silicon nitride. More Details
- Disk Thickness: 200µm silicon support
- Disk Diameter: 3mm
- Surface Roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm
- Packaging: The PELCO® Silicon Nitride Discs with hydrophilic or hydrophobic coating are packaged under cleanroom conditions in the PELCO® #160 TEM Grid Storage box. Each box holds 10 discs. The other discs are packed in a vial holding 10 discs.
